STATIC ELIMINATOR OF WAFER AND STATIC ELIMINATION METHOD OF WAFER

PROBLEM TO BE SOLVED: To prevent impurities deposited in a tip of an electrode needle of an ionizer using corona discharge from dropping on a wafer surface.SOLUTION: A static eliminator of a wafer is used. The static eliminator of a wafer includes: a cover 13 covering above a prealigner 1; and an io...

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Bibliographic Details
Main Authors SUGAI JUNJI, KOBAYASHI TOMOKAZU, KOMATSU KENICHI, MATSUMURA YASUHIDE
Format Patent
LanguageEnglish
Published 22.12.2011
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To prevent impurities deposited in a tip of an electrode needle of an ionizer using corona discharge from dropping on a wafer surface.SOLUTION: A static eliminator of a wafer is used. The static eliminator of a wafer includes: a cover 13 covering above a prealigner 1; and an ion supply part 14 disposed on a periphery of the cover 13 or below the periphery. An ion supply port 15 of the ion supply part 14 is arranged to face a space formed between the cover 13 and the prealigner 1.
Bibliography:Application Number: JP20100131558