SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
PROBLEM TO BE SOLVED: To provide a semiconductor device, along with a method for manufacturing the same, which is equipped with an electrical fuse for sure disconnection.SOLUTION: The electrical fuse has a lamination structure consisting of a polysilicon film 14 and a metal silicide film 15 such as...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English |
Published |
04.11.2011
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | PROBLEM TO BE SOLVED: To provide a semiconductor device, along with a method for manufacturing the same, which is equipped with an electrical fuse for sure disconnection.SOLUTION: The electrical fuse has a lamination structure consisting of a polysilicon film 14 and a metal silicide film 15 such as tungsten silicide. By allowing a current of current density 40 mA/μmor higher to flow the electrical fuse of a predetermined length, the electrical fuse is surely disconnected by electromigration and pinch effect. |
---|---|
Bibliography: | Application Number: JP20100089405 |