METHOD OF SPRAY APPLICATION OF MONOLITHIC REFRACTORY AND SPRAY APPLICATION DEVICE

PROBLEM TO BE SOLVED: To provide a technology of spray application capable of shortening a time lag from operation for reducing an amount of water for application to emission of a kneaded material reduced in the water for application from a nozzle, regardless of use of a kneader configuring an airfl...

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Bibliographic Details
Main Authors TSUKUDA JUNICHI, UCHIDA TAKAYUKI, ITO SATOSHI, SEKI KAZUNORI, FURUTA YOICHI, HANAGIRI SEIJI
Format Patent
LanguageEnglish
Published 27.10.2011
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Summary:PROBLEM TO BE SOLVED: To provide a technology of spray application capable of shortening a time lag from operation for reducing an amount of water for application to emission of a kneaded material reduced in the water for application from a nozzle, regardless of use of a kneader configuring an airflow conveying passage for a monolithic refractory.SOLUTION: A second water injector 7 is disposed at the downstream side of the kneader 4 in addition to a first water injector 3 disposed at the upstream side of the kneader 4, and the water is injected from both of the first and second water injectors 3, 7. The total amount of water for application is reduced by using at least the second water injector 7 of the first and second water injectors 3, 7.
Bibliography:Application Number: JP20100081981