EXPOSURE METHOD OF EXPOSURE DEVICE

PROBLEM TO BE SOLVED: To increase efficiency of exposure, and to reduce device cost.SOLUTION: Two moving tables 3, 3 loaded respectively with a substrate holder 1 for holding each substrate W as a member to be exposed are arranged movably by a moving unit between an exposure position and a position...

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Bibliographic Details
Main Authors IMAI KATSUKI, MATSUZAKA MASAAKI
Format Patent
LanguageEnglish
Published 13.10.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To increase efficiency of exposure, and to reduce device cost.SOLUTION: Two moving tables 3, 3 loaded respectively with a substrate holder 1 for holding each substrate W as a member to be exposed are arranged movably by a moving unit between an exposure position and a position where two substrates W facing across the exposure position are carried in and carried out. When the substrate holder 1 of one moving substrate W is arranged on the exposure position, the substrate W is repeated to be carried in and carried out alternately relative to the substrate holder 1 on the moving table 3 not arranged on the exposure position.
Bibliography:Application Number: JP20110097631