ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD USING THE COMPOSITION

• Main Authors: FUJII KANA, TARUYA SHINJI, IWATO KAORU, ENOMOTO YUICHIRO, KATO KEITA, DOBASHI TORU, KAMIMURA SATOSHI, MIZUTANI KAZUYOSHI, KATAOKA SHOHEI
• Format: Patent
• Language: English
• Published: 13.10.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition which is excellent in stability with time, a development defect performance and a roughness characteristic, and also to provide a pattern forming method using the composition.SOLUTION: This active ray-sensitive or radiation-sensitive resin composition contains: a resin containing a repeated unit including a group generating an alcoholic hydroxy group by being decomposed by action of an acid, whose solubility to a developing solution containing an organic solvent is reduced by action of the acid; a compound generating an acid by irradiation of an active ray or a radiation; and a solvent. The moisture content rate measured by the Karl Fischer's method is ≤1.0 mass%.