METHOD AND SYSTEM OF AUTOMATIC LIQUID DISPENSING FOR IMPRINT LITHOGRAPHY PROCESS

PROBLEM TO BE SOLVED: To provide a liquid dispensing system and method, applicable to an imprint lithography process. SOLUTION: An automatic liquid dispensing method and system for dispensing liquid on a surface of a plate-like material or a substrate including a semiconductor wafer for an imprint l...

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Bibliographic Details
Main Authors BAILEY TODD, SREENIVASAN S V, WILLSON C GRANT, ECKERDT JOHN, COLBURN MATTHEW, CHOI BYUNG JIN
Format Patent
LanguageEnglish
Published 08.09.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MATERIALS THEREFOR
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
NANOTECHNOLOGY
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TRANSPORTING
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Summary:PROBLEM TO BE SOLVED: To provide a liquid dispensing system and method, applicable to an imprint lithography process. SOLUTION: An automatic liquid dispensing method and system for dispensing liquid on a surface of a plate-like material or a substrate including a semiconductor wafer for an imprint lithography process is disclosed. The dispensing method uses: a substrate stage generating relative movement between a liquid dispenser chip and the substrate; and a liquid dispenser. Also a method and device for flattening a substrate surface using an unpatterned planar template is disclosed. COPYRIGHT: (C)2011,JPO&INPIT
Bibliography:Application Number: JP20110051870