METHOD OF MANUFACTURING ELECTRO-OPTICAL DEVICE

• Main Authors: ONO TATSUKI, KATO YOSHIKATSU
• Format: Patent
• Language: English
• Published: 11.08.2011
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PROBLEM TO BE SOLVED: To remove metal impurities remaining on the surface of a substrate appropriately. SOLUTION: A cleaning process in a method of manufacturing an electro-optical device includes an ozone water treatment step for supplying ozone water to the surface of a substrate, a first rinse treatment step for supplying pure water to the surface of a substrate after the ozone water treatment step, a first dilute hydrofluoric acid treatment step for supplying a dilute hydrofluoric acid to the surface of a substrate following to the first rinse treatment step, a second rinse treatment step for supplying pure water to the surface of a substrate after the first dilute hydrofluoric acid treatment step, a first mixed fluid treatment step for supplying a mixed fluid of a cleaning liquid and gas to the surface of a substrate after the second rinse treatment step, a third rinse treatment step for supplying pure water to the surface of a substrate after the first mixed fluid treatment step, a second dilute hydrofluoric acid treatment step for supplying dilute hydrofluoric acid to the surface of a substrate after the third rinse treatment step, a fourth rinse treatment step for supplying pure water to the surface of a substrate after the second dilute hydrofluoric acid treatment step, and a drying step for drying the substrate after the fourth rinse treatment step. COPYRIGHT: (C)2011,JPO&INPIT