SYSTEM AND METHOD USING TWO-PART COVER FOR PROTECTING RETICLE

• Main Authors: ALIKHAN ABDULLAH, FEROCE JONATHAN H, MASSAR ANDREW, LOOPSTRA ERIC R, KISH DUANE P, OLSON WOODROW J, DEL PUERTO SANTIAGO
• Format: Patent
• Language: English
• Published: 14.07.2011
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; CONVEYING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HANDLING THIN OR FILAMENTARY MATERIAL; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PACKING; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PNEUMATIC TUBE CONVEYORS; SEMICONDUCTOR DEVICES; SHOP CONVEYOR SYSTEMS; STORING; TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a system and a method for protecting a mask from being contaminated by airborne particles. SOLUTION: The system and method include a step of providing a reticle secured in a two-part cover. The two-part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box. The pod or box can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process. A pattern on the reticle can be formed on a wafer during the exposure process. COPYRIGHT: (C)2011,JPO&INPIT