METHOD FOR FORMING ZIRCONIA FILM

• Main Author: FUCHIDA HIDETSUGU
• Format: Patent
• Language: English
• Published: 26.05.2011
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a method for forming a zirconia film wherein good film quality can be achieved by an aerosolized gas deposition method. SOLUTION: In the method for forming the zirconia film by the aerosolized gas deposition method, zirconia fine particles P having an average particle diameter of ≥2 μm and ≤4 μm and a specific surface area of ≥4 m2/g and ≤7 m2/g are contained in a hermetically sealed container 2; an aerosol A of the zirconia fine particles P is formed by introducing a gas into the hermetically sealed container 2; and the aerosol A is conveyed into a film formation chamber 3, which is maintained at a pressure lower than that of the hermetically sealed container 2 through a conveying pipe 6 that is connected to the hermetically sealed container 2, so that the zirconia fine particles P are deposited on a substrate S that is contained in the film formation chamber 3. By using zirconia fine particles satisfying the above-described conditions, a dense zirconia thin film having high adhesion to the substrate can be formed. COPYRIGHT: (C)2011,JPO&INPIT