CLEANING DEVICE, LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS CLEANING METHOD

PROBLEM TO BE SOLVED: To provide a lithographic apparatus which carries out cleaning readily and effectively, and also to provide a method for effectively cleaning an immersion lithographic apparatus. SOLUTION: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithogr...

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Bibliographic Details
Main Authors DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS, JANSEN BAUKE, BEEREN RAYMOND GERARDUS MARIUS, HOEKERD KORNELIS TIJMEN
Format Patent
LanguageEnglish
Published 12.05.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:PROBLEM TO BE SOLVED: To provide a lithographic apparatus which carries out cleaning readily and effectively, and also to provide a method for effectively cleaning an immersion lithographic apparatus. SOLUTION: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, and the liquid confinement system has an aperture to allow passage of a beam of radiation through the liquid confinement system of an immersion lithographic apparatus. The cleaning tool includes: a sonic transducer; a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned; and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves. COPYRIGHT: (C)2011,JPO&INPIT
Bibliography:Application Number: JP20110028118