LIQUID PROCESSING APPARATUS FOR SUBSTRATE, METHOD FOR GENERATING PROCESSING LIQUID, AND COMPUTER READABLE RECORDING MEDIUM RECORDING PROGRAM FOR GENERATING PROCESSING LIQUID THEREIN

• Main Author: EJIMA KAZUYOSHI
• Format: Patent
• Language: English
• Published: 21.04.2011
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To generate a processing liquid with a predetermined concentration regardless of the flow rate of the processing liquid used simultaneously. SOLUTION: There are provided: a liquid processing apparatus (1) for a substrate which includes a plurality of substrate processing units (11 to 22) configured to process the substrate using the processing liquid, a processing liquid generating unit (24) configured to dissolve a gas into a solvent to generate the processing liquid with the predetermined concentration where the processing liquid is supplied to one of the plurality of substrate processing units (11 to 22) or supplied to two or more of the plurality of substrate processing units (11 to 22) simultaneously, and a control unit (25) configured to control the plurality of substrate processing units (11 to 22) and processing liquid generating unit (24); a method for generating the processing liquid; and a recording medium (50) recording a program for generating the processing liquid therein. The solvent supplied from a solvent supply source (34) is branched and supplied to a dissolving flow passage (36) for dissolving the gas into the solvent via a gas dissolving unit (41) and a bypass flow passage (37) connected in parallel with the dissolving flow passage (36), and flow passage resistance of the bypass flow passage (37) is varied so that the ratio of the flow rate of the solvent flowing in the dissolving flow passage (36) and the flow rate of the solvent flowing in the bypass flow passage (37) is constant. COPYRIGHT: (C)2011,JPO&INPIT