OPTICAL PROJECTION SYSTEM, ALIGNER, AND METHOD OF MANUFACTURING DEVICE

• Main Author: FUKAMI SEIJI
• Format: Patent
• Language: English
• Published: 21.04.2011
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a projection optical system capable of correcting magnification in two directions orthogonal to each other while suppressing the generation of astigmatism. SOLUTION: In an optical projection system PO, a first flat mirror 13, a first concave mirror 14, a convex mirror 15, a second concave mirror 16, and a second flat mirror 17 are arranged in this order on the optical path running from the side of an object surface OP to an image plane IP with an optical path between the object surface and the first flat mirror parallel to the optical path between the second flat mirror and the image plane. The optical projection system includes a first optical system 10 which corrects the magnification of the optical projection system arranged in the optical path between the object surface and the first flat mirror, a second optical system 18 that corrects the magnification of the optical projection system arranged in the optical path between the second flat mirror and the image plane, third optical systems 11 and 12 which are arranged in the optical path between the object surface and the first flat mirror or the optical path between the second flat mirror and the image plane to correct the magnification of the optical projection system, and a control part C. The amount to be corrected which is required by the optical projection system is obtained by controlling corrective amounts of the first optical system, the second optical system, and the third optical system. COPYRIGHT: (C)2011,JPO&INPIT