METHOD FOR DESIGNING PHOTOMASK AND DESIGN PROGRAM OF PHOTOMASK

• Main Author: KAI YASUNOBU
• Format: Patent
• Language: English
• Published: 31.03.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

PROBLEM TO BE SOLVED: To provide a method for designing a photomask and a design program of a photomask, capable of appropriately arranging an assist pattern. SOLUTION: The method for designing a photomask includes procedures of: arranging a plurality of evaluation patterns around a design pattern; setting an evaluation index relating to imaging characteristics of the design pattern on an imaging plane; determining a light intensity distribution on the imaging plane of the design pattern by combining a light intensity distribution by the design pattern and a light intensity distribution of the evaluation pattern; determining a region where an effective evaluation pattern is arranged by evaluating the light intensity distribution on the imaging plane of the design pattern by use of the evaluation index; determining arrangement conditions of an assist pattern on the basis of the region where the effective evaluation pattern is arranged; and creating a pattern layout by arranging an assist pattern around the design pattern on the basis of the arrangement conditions. COPYRIGHT: (C)2011,JPO&INPIT