CVD APPARATUS AND OPERATION METHOD THEREOF

• Main Authors: IKEDA MASAKIYO, KIKUCHI KOJI
• Format: Patent
• Language: English
• Published: 24.03.2011
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a solution-vaporizing CVD apparatus equipped with a vaporizer that vaporizes a material solution and supplies the resulting gas to a reaction chamber and to provide an operation method of the CVD apparatus preventing a nozzle of the vaporizer from being clogged by material solution or the like leaked into a piping under pausing of the apparatus, stably supplying the material solution, and reducing the frequency of maintenance. SOLUTION: The solution-vaporizing CVD apparatus 100 in which the material solution is combined with a spraying gas before it is introduced into the vaporizer 50 includes: a stop valve VE installed, in a material solution transport pipe 30, at the downstream of its connection point with a material solution supplying part 10 and its connection point with a solvent supplying part 20 and the upstream of its junction with a gas transport pipe 40 in order to fill the upstream of the stop valve VE with a solvent. COPYRIGHT: (C)2011,JPO&INPIT