METHOD FOR FORMING METAL OXIDE THIN FILM PATTERN AND METHOD FOR PRODUCING LED ELEMENT BY USING NANOIMPRINTING

PROBLEM TO BE SOLVED: To provide a method for forming a metal oxide thin film pattern by applying a photosensitive metal-organic material precursor solution onto a substrate without using a photosensitive prepolymer resin and directly patterning a coating film layer of the applied solution by a nano...

Full description

Saved in:
Bibliographic Details
Main Authors JEON SO-HEE, CHOI DAE-GEUN, KIM KI-DON, CHOI JUN HYUK, KIM SA-RAH, YI JI-HYE, PARK HYEONG-HO, JEONG JUN-HO, PARK SEONG-JE
Format Patent
LanguageEnglish
Published 17.03.2011
Subjects
ADHESIVES
BASIC ELECTRIC ELEMENTS
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F
COMPOUNDS THEREOF
CORRECTING FLUIDS
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FILLING PASTES
INKS
INORGANIC CHEMISTRY
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
NON-METALLIC ELEMENTS
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
POLISHES
SEMICONDUCTOR DEVICES
USE OF MATERIALS THEREFOR
WOODSTAINS
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To provide a method for forming a metal oxide thin film pattern by applying a photosensitive metal-organic material precursor solution onto a substrate without using a photosensitive prepolymer resin and directly patterning a coating film layer of the applied solution by a nanoimprint system and to provide the metal oxide thin film pattern patterned directly by this forming method and a method for producing an LED element including a photonic crystal layer by using this forming method. SOLUTION: The method for forming the metal oxide thin film pattern by using nanoimprinting includes the steps of: applying the photosensitive metal-organic material precursor solution onto the substrate to form a photosensitive metal-organic material precursor coating film layer; pressurizing the photosensitive metal-organic material precursor coating film layer by using a mold patterned to have a rugged structure; irradiating the pressurized photosensitive metal-organic material precursor coating film layer with ultraviolet rays to form the cured metal oxide thin film pattern; and removing the patterned mold from the metal oxide thin film pattern. COPYRIGHT: (C)2011,JPO&INPIT
Bibliography:Application Number: JP20100001538