GAS BARRIER FILM AND DEVICE

PROBLEM TO BE SOLVED: To provide a gas barrier film excellent in barrier property and flexibility. SOLUTION: The gas barrier film comprises a substrate film 1, a first organic layer 2, an inorganic layer 3, and an outermost organic layer 4 in this order, wherein the outermost organic layer has a thi...

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Bibliographic Details
Main Author MURAKAMI ASAO
Format Patent
LanguageEnglish
Published 17.03.2011
Subjects
AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
BASIC ELECTRIC ELEMENTS
CHEMISTRY
COMPOSITIONS BASED THEREON
ELECTRIC HEATING
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GENERAL PROCESSES OF COMPOUNDING
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
PERFORMING OPERATIONS
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
TRANSPORTING
WORKING-UP
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Summary:PROBLEM TO BE SOLVED: To provide a gas barrier film excellent in barrier property and flexibility. SOLUTION: The gas barrier film comprises a substrate film 1, a first organic layer 2, an inorganic layer 3, and an outermost organic layer 4 in this order, wherein the outermost organic layer has a thickness of 0.3 μm or more, and (a)/(b)≥2 is satisfied, wherein (a) represents the thickness of the outermost organic layer, and (b) represents the thickness of the first organic layer. COPYRIGHT: (C)2011,JPO&INPIT
Bibliography:Application Number: JP20090201849