METHOD OF MEASURING CONSTITUENT IN THIN-FILM MATERIAL COMPOSITION

• Main Authors: NISHIDA AKIHIRO, SHIRATORI TSUBASA, SHIMADA SADASUKE, SUZUKI SHINICHI
• Format: Patent
• Language: English
• Published: 10.03.2011
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; METALLURGY; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TESTING

PROBLEM TO BE SOLVED: To provide a method of measuring one portion or entire portion of effective constituents of a thin-film material composition that is a composition of not less than two constituents used for forming a thin film of a metal-containing material and contains at least one type of metal compound and other compounds as effective constituents. SOLUTION: In the method of measuring constituents, spectrum absorption by a near infrared spectroscopy is used as a method of measuring active constituents suitable for measuring constituents in a manufacturing process of a thin film for a thin-film material composition. COPYRIGHT: (C)2011,JPO&INPIT