SPECTRAL PURITY FILTER FOR USE IN LITHOGRAPHIC APPARATUS

• Main Authors: SOER WOUTER ANTHON, BANINE VADIM YEVGENYEVICH, JAK MARTIN JACOBUS JOHAN, WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES, YAKUNIN ANDREY MIKHAILOVICH
• Format: Patent
• Language: English
• Published: 03.03.2011
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide an improved or alternative spectral purity filter. SOLUTION: The spectral purity filter includes a plurality of apertures penetrating a member. The aperture is formed to suppress radiation having a first wavelength, and transmit at least a part of radiation having a second wavelength. The second wavelength of the radiation is shorter than the first wavelength of the radiation. A first region of the spectral purity filter has a first structure that provides a first radiation transmission profile to the radiation, having the first wavelength and the radiation having the second wavelength, and a second region of the spectral purity filter has a second different structure to provide a second different radiation transmission profile to the radiation, having the first wavelength and the radiation having the second wavelength. COPYRIGHT: (C)2011,JPO&INPIT