EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

• Main Author: FUKAMI SEIJI
• Format: Patent
• Language: English
• Published: 24.02.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To suppress the decline of image forming characteristics due to nonuniform temperature distribution which can occur in the lens of a projection optical system. SOLUTION: In the exposure apparatus having the projection optical system for projecting the pattern of an precursor 9 arranged on an object plane to a substrate 18 arranged on an image plane, the projection optical system includes: a first plane mirror 11, a first concave mirror 12, a convex mirror 14, a second concave mirror 15 and a second plane mirror 16 arranged in the order from the object plane in an optical path from the object plane to the image plane; and a dioptric system 20 having positive power arranged between the first concave mirror 12 and the convex mirror 14 and between the convex mirror 14 and the second concave mirror 15. The dioptric system 20 includes: a first lens 13a comprising a material for which the temperature change coefficient of a refractive index is positive; and a second lens 13b comprising a material for which the temperature change coefficient of the refractive index is negative. COPYRIGHT: (C)2011,JPO&INPIT