POLISHING LIQUID COMPOSITION FOR GLASS SUBSTRATE

PROBLEM TO BE SOLVED: To provide a polishing liquid composition capable of improving a polishing speed. SOLUTION: This polishing liquid composition for a glass substrate contains copolymer having a structure unit expressed by a formula (I), and a structure unit derived from hydrophobic monomer havin...

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Bibliographic Details
Main Authors YONEDA YASUHIRO, DOI AKIHIKO
Format Patent
LanguageEnglish
Published 17.02.2011
Subjects
ADHESIVES
CHEMISTRY
DRESSING OR CONDITIONING OF ABRADING SURFACES
DYES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PERFORMING OPERATIONS
PHYSICS
POLISHES
POLISHING
TRANSPORTING
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Summary:PROBLEM TO BE SOLVED: To provide a polishing liquid composition capable of improving a polishing speed. SOLUTION: This polishing liquid composition for a glass substrate contains copolymer having a structure unit expressed by a formula (I), and a structure unit derived from hydrophobic monomer having solubility of 2g or less relative to 20°C water of 100g, and silica particles. The monomer for forming the structure unit expressed by the formula (I) includes methoxy polyethylene glycol methacrylate and the like, and the hydrophobic monomer includes styrene and the like. R1 is a hydrogen atom or a methyl group, R2 is an alkyl group with a carbon number of 1-4, AO is an oxy-alkylene group with a carbon number of 1-8, p is 0 or 1, n is an average addition mol number of AO of 3-300, and a proportion occupied by an oxy-ethylene group in (AO)n is 80 mol% or more. COPYRIGHT: (C)2011,JPO&INPIT
Bibliography:Application Number: JP20090178103