RADIATION SYSTEM, AND LITHOGRAPHIC DEVICE

• Main Authors: LOOPSTRA ERIK ROELOF, IVANOV VLADIMIR VITALEVICH, SWINKELS GERARDUS HUBERTUS PETRUS MARIA, DE GRAAF DENNIS, MOORS JOHANNES HUBERTUS JOSEPHINA, STAMM UWE BRUNO HEINI, YAKUNIN ANDREY MIKHAILOVICH
• Format: Patent
• Language: English
• Published: 27.01.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; DEVICES USING STIMULATED EMISSION; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; X-RAY TECHNIQUE

PROBLEM TO BE SOLVED: To provide a radiation system capable of improving conversion efficiency of EUV radiation/emission plasma, and to provide a lithographic device.SOLUTION: The radiation system includes a target material source for supplying droplets of a target material along a track, and a laser system including an amplifier and an optical system. The optical system establishes a first beam path which passes through the amplifier and a first point on the track, and establishes a second beam path which passes through the amplifier and a second point on the track. When a photon emitted from the amplifier is reflected along the first beam path by the droplet of the target material at the first point on the track, the laser system generates a first pulse of laser radiation. When a photon emitted from the amplifier is reflected along the second beam path by the droplet of the target material at the second point on the track, the laser system generates a second pulse of laser radiation.