SENSOR FOR LIQUID IMMERSION LITHOGRAPHIC APPARATUS

PROBLEM TO BE SOLVED: To provide a sensor effective for a liquid immersion apparatus.SOLUTION: This sensor includes a detector, a transparent layer and an opaque pattern layer. The detector is configured to sense a characteristic of a radiation beam. The transparent layer is configured to allow the...

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Main Authors VAN BUEL HENRICUS WILHELMUS MARIA, VAN DER GRAAF SANDRA, BROEKHUIJSE JEROEN THOMAS, DZIOMKINA NINA VLADIMIROVNA, PROSYENTSOV VITALIY
Format Patent
LanguageEnglish
Published 06.01.2011
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a sensor effective for a liquid immersion apparatus.SOLUTION: This sensor includes a detector, a transparent layer and an opaque pattern layer. The detector is configured to sense a characteristic of a radiation beam. The transparent layer is configured to allow the passage of the radiation beam therethrough. The transparent layer covers the detector. The opaque pattern layer is configured to impart a pattern to the radiation beam. The patterning layer is provided with an opening, and a filling material is arranged in the opening. The filling material is transparent to the radiation beam and has a refractive index identical to that of the transparent layer.
Bibliography:Application Number: JP20100135725