EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide an exposure apparatus having a projection optical system that can be easily manufactured. SOLUTION: The exposure apparatus projects a pattern of an original plate to a substrate by a projection optical system to expose the substrate where the projection optical syste...

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Bibliographic Details
Main Authors FUKAMI SEIJI, MIYAZAKI KYOICHI
Format Patent
LanguageEnglish
Published 09.12.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide an exposure apparatus having a projection optical system that can be easily manufactured. SOLUTION: The exposure apparatus projects a pattern of an original plate to a substrate by a projection optical system to expose the substrate where the projection optical system includes a mirror assembly including a first mirror member having a first reflecting surface that bends an optical axis of the projection optical system, a second mirror member having a second reflecting surface that bends the optical axis, and a support mechanism that supports the first mirror member and the second mirror member. By an effect that the support mechanism is positioned, the first mirror member and the second mirror member are positioned while the relative positional relation of the first mirror member and the second mirror member is maintained. COPYRIGHT: (C)2011,JPO&INPIT
Bibliography:Application Number: JP20090132427