REACTION FORCE PROCESSING MECHANISM

• Main Authors: NISHIMAKI JUN, NAKAMORI YASUHITO, TOMITA YOSHIYUKI
• Format: Patent
• Language: English
• Published: 11.11.2010
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT; DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACHINE TOOLS; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS; MATERIALS THEREFOR; METAL-WORKING NOT OTHERWISE PROVIDED FOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TRANSPORTING

PROBLEM TO BE SOLVED: To restrain vibration of a surface plate and to downsize a stage apparatus. SOLUTION: In a mechanism 50, a shaft 12x is connected and fixed to a rack 2 by a frame 21, a guide 22 allows the shaft 12x to relatively move in an X-axis direction with respect to the surface plate 4, and X-axis reaction force is released between the surface plate 4 and the X-axis shaft 12x. Accordingly when the X-axis reaction force is applied to the shaft 12x, the X-axis reaction force is transferred to the rack 2 without being transferred to the surface plate 4. As relative movement of the shaft 12x and the surface plate 4 in Y-axis and Z-axis directions is regulated by the guide 22, these positional relations are maintained. Since the shaft 12x is connected and fixed to the rack 2 through an escape mechanism 24, shift of the shaft 12x by external force applied to the rack 2 for example is restrained. Thus contact of the shaft 12x and a coil part 13x is restrained without increasing a distance therebetween. COPYRIGHT: (C)2011,JPO&INPIT