ORGANIC SOLVENT BASED DEVELOPMENT OR MULTIPLE DEVELOPMENT PATTERN-FORMING METHOD USING ELECTRON BEAM OR EUV RAY

• Main Authors: TSUBAKI HIDEAKI, SHIRAKAWA KOJI, DOBASHI TORU
• Format: Patent
• Language: English
• Published: 30.09.2010
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a pattern-forming method, which satisfies high sensitivity, high resolution, a good pattern form and a residual film rate in a super-fine processing region. SOLUTION: The pattern-forming method includes, in the following order: (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition including a resin which includes an acid-decomposable repeating unit and decreases in the solubility in an organic solvent by the action of an acid; (2) a process of exposing the film with an electron beam or an EUV ray; and (4) a process of developing the film with a developer containing an organic solvent after exposure. COPYRIGHT: (C)2010,JPO&INPIT