APPARATUS AND PROGRAM FOR INSPECTING AND REMOVING FOREIGN SUBSTANCE

PROBLEM TO BE SOLVED: To reduce a user's workload by automatically determining a removal of foreign substances, eliminate an determination error, protect a substrate W against damage, and prevent a longer work time. SOLUTION: An apparatus includes: a foreign substance information acquisition se...

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Bibliographic Details
Main Authors OTSUKI KUNIO, KANZAKI TOYOKI
Format Patent
LanguageEnglish
Published 24.09.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MATERIALS THEREFOR
MEASURING
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TESTING
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Summary:PROBLEM TO BE SOLVED: To reduce a user's workload by automatically determining a removal of foreign substances, eliminate an determination error, protect a substrate W against damage, and prevent a longer work time. SOLUTION: An apparatus includes: a foreign substance information acquisition section 3 acquiring foreign substance information of the foreign substances adhered to a surface of the substrate; a foreign substance removal section 4 removing the adhered foreign substances; a comparison section 54 comparing a threshold set for each area of the surface W1 of the substrate with the foreign substance information for each area obtained from the foreign substance information acquisition section 3; and a foreign substance removal control section 55 making the foreign substance removal section 4 remove the foreign substances from the surface W1 of the substrate based on a comparison result of the comparison section 54. COPYRIGHT: (C)2010,JPO&INPIT
Bibliography:Application Number: JP20090058765