APPARATUS AND PROGRAM FOR INSPECTING AND REMOVING FOREIGN SUBSTANCE

PROBLEM TO BE SOLVED: To reduce a user's workload by automatically determining a removal of foreign substances, eliminate an determination error, protect a substrate W against damage, and prevent a longer work time. SOLUTION: An apparatus includes: a foreign substance information acquisition se...

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Bibliographic Details
Main Authors OTSUKI KUNIO, KANZAKI TOYOKI
Format Patent
LanguageEnglish
Published 24.09.2010
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Summary:PROBLEM TO BE SOLVED: To reduce a user's workload by automatically determining a removal of foreign substances, eliminate an determination error, protect a substrate W against damage, and prevent a longer work time. SOLUTION: An apparatus includes: a foreign substance information acquisition section 3 acquiring foreign substance information of the foreign substances adhered to a surface of the substrate; a foreign substance removal section 4 removing the adhered foreign substances; a comparison section 54 comparing a threshold set for each area of the surface W1 of the substrate with the foreign substance information for each area obtained from the foreign substance information acquisition section 3; and a foreign substance removal control section 55 making the foreign substance removal section 4 remove the foreign substances from the surface W1 of the substrate based on a comparison result of the comparison section 54. COPYRIGHT: (C)2010,JPO&INPIT
Bibliography:Application Number: JP20090058765