ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMING PATTERN BY USING THE COMPOSITION

• Main Authors: NISHIKAWA NAOYUKI, TSUBAKI HIDEAKI, TSUCHIMURA TOMOTAKA, DOBASHI TORU, YAMASHITA KATSUHIRO, TAKAHASHI HIDETOMO
• Format: Patent
• Language: English
• Published: 12.08.2010
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a positive resist composition satisfying requirements for high sensitivity, high resolution, a good pattern profile, good line edge roughness and reduction in outgassing, in an ultrafine region, particularly, in electron beam, X-ray or EUV lithography, and to provide a method for forming a pattern by using the composition. SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains: a resin (P) having a repeating unit (A) that is decomposed by irradiation with actinic rays or radiation to generate an acid and a repeating unit (B) that is decomposed by an action of an acid to increase the solubility of the resin with an alkali aqueous solution; and a compound (U) that is unevenly present on a film surface when a film is formed, giving a protective film. COPYRIGHT: (C)2010,JPO&INPIT