METHOD FOR PROVIDING LIQUID DISCHARGE HEAD
PROBLEM TO BE SOLVED: To provide a liquid discharge head which reduces depositions to the surface of a discharge port, and provides good discharge free from twist in its discharge direction. SOLUTION: The method for producing the liquid discharge head comprises: a step where the surface of a substra...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
22.07.2010
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a liquid discharge head which reduces depositions to the surface of a discharge port, and provides good discharge free from twist in its discharge direction. SOLUTION: The method for producing the liquid discharge head comprises: a step where the surface of a substrate is provided with a layer made of polyether amide; a step where the surface of the layer made of polyether amide is provided with a resin layer using a solution obtained by dissolving a resin into a nonannular liquid having a carbonyl group; a step where the resin layer is subjected to patterning to convert the resin layer into a pattern having a shape of a flow path; a step where a layer which becomes a flow path forming member is provided so as to cover the surface of the pattern; and a step where the pattern is removed to form the flow path. COPYRIGHT: (C)2010,JPO&INPIT |
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Bibliography: | Application Number: JP20090269185 |