METHOD FOR CLEANING PHOTOMASK-RELATED SUBSTRATE

• Main Author: NUMANAMI TSUNEO
• Format: Patent
• Language: English
• Published: 27.05.2010
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a cleaning method extremely reducing the generation of microcontaminations (particles) when a photomask-related substrate selected from a substrate for a photomask, a photomask blank, a photomask and a production intermediate thereof is cleaned. SOLUTION: The method for cleaning a photomask-related substrate includes a deaerating step of preliminarily subjecting pure water to be used for the cleaning to a deaeration to remove dissolved gas and to a heating step of heating the water, when a photomask-related substrate contaminated by a sulfate ion is cleaned with pure water, the photomask-related substrate being selected from a substrate for a photomask, a photomask blank, a photomask and a production intermediate thereof. COPYRIGHT: (C)2010,JPO&INPIT