METHOD FOR CLEANING PHOTOMASK-RELATED SUBSTRATE
PROBLEM TO BE SOLVED: To provide a cleaning method extremely reducing the generation of microcontaminations (particles) when a photomask-related substrate selected from a substrate for a photomask, a photomask blank, a photomask and a production intermediate thereof is cleaned. SOLUTION: The method...
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Main Author | |
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Format | Patent |
Language | English |
Published |
27.05.2010
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a cleaning method extremely reducing the generation of microcontaminations (particles) when a photomask-related substrate selected from a substrate for a photomask, a photomask blank, a photomask and a production intermediate thereof is cleaned. SOLUTION: The method for cleaning a photomask-related substrate includes a deaerating step of preliminarily subjecting pure water to be used for the cleaning to a deaeration to remove dissolved gas and to a heating step of heating the water, when a photomask-related substrate contaminated by a sulfate ion is cleaned with pure water, the photomask-related substrate being selected from a substrate for a photomask, a photomask blank, a photomask and a production intermediate thereof. COPYRIGHT: (C)2010,JPO&INPIT |
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Bibliography: | Application Number: JP20080288603 |