METHOD FOR CLEANING PHOTOMASK-RELATED SUBSTRATE

PROBLEM TO BE SOLVED: To provide a cleaning method extremely reducing the generation of microcontaminations (particles) when a photomask-related substrate selected from a substrate for a photomask, a photomask blank, a photomask and a production intermediate thereof is cleaned. SOLUTION: The method...

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Bibliographic Details
Main Author NUMANAMI TSUNEO
Format Patent
LanguageEnglish
Published 27.05.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:PROBLEM TO BE SOLVED: To provide a cleaning method extremely reducing the generation of microcontaminations (particles) when a photomask-related substrate selected from a substrate for a photomask, a photomask blank, a photomask and a production intermediate thereof is cleaned. SOLUTION: The method for cleaning a photomask-related substrate includes a deaerating step of preliminarily subjecting pure water to be used for the cleaning to a deaeration to remove dissolved gas and to a heating step of heating the water, when a photomask-related substrate contaminated by a sulfate ion is cleaned with pure water, the photomask-related substrate being selected from a substrate for a photomask, a photomask blank, a photomask and a production intermediate thereof. COPYRIGHT: (C)2010,JPO&INPIT
Bibliography:Application Number: JP20080288603