QUANTUM DOT TYPE INFRARED DETECTING ELEMENT

PROBLEM TO BE SOLVED: To improve quantum efficiency in a quantum dot type infrared detecting element in which a photoelectric conversion layer is formed by a quantum dot layer. SOLUTION: The quantum dot type infrared detecting element has: a semiconductor substrate; a plurality of photoelectric conv...

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Bibliographic Details
Main Authors NISHINO HIROSHI, KIBE MICHIYA, UCHIYAMA YASUHITO, NAGASHIMA MITSUHIRO, KAJIWARA NOBUYUKI, TOSHIDA MINORU
Format Patent
LanguageEnglish
Published 06.05.2010
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Summary:PROBLEM TO BE SOLVED: To improve quantum efficiency in a quantum dot type infrared detecting element in which a photoelectric conversion layer is formed by a quantum dot layer. SOLUTION: The quantum dot type infrared detecting element has: a semiconductor substrate; a plurality of photoelectric conversion layers in which a plurality of quantum dot layers having a plurality of quantum dots formed on the same planar and an intermediate layer covering the quantum dots is laminated on the semiconductor substrate; and a distortion buffer layer matching with the semiconductor substrate and in which a p-type semiconductor layer and an n-type semiconductor layer are laminated. The photoelectric conversion layers are laminated via the distortion buffer layer. COPYRIGHT: (C)2010,JPO&INPIT
Bibliography:Application Number: JP20080271608