CHARGED PARTICLE BEAM APPARATUS AND FOCUSED ION BEAM APPARATUS

PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus and a focused ion beam apparatus, capable of lowering a charged particle accelerating voltage, while suppressing a decrease in precision and efficiency of processing due to charged particle beams. SOLUTION: When a voltage applied bet...

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Main Authors SASAKI MASAJI, KAGA HIROYASU, AZUMA JUNZO
Format Patent
LanguageEnglish
Published 06.05.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Abstract PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus and a focused ion beam apparatus, capable of lowering a charged particle accelerating voltage, while suppressing a decrease in precision and efficiency of processing due to charged particle beams. SOLUTION: When a voltage applied between an LMIS 1 and an extraction electrode 13 is set to 5 to 8 (kV) and an applied voltage to a condenser lens 2 is set to 0 (kV), a distance between the upstream-side surface of the extraction electrode 13 and the beam limiting aperture 14 is determined so that a condition of an applied voltage Va to an acceleration electrode 15 and an applied voltage Vobj to an objective lens 8 in focusing charged particles on a sample 10 through an objective lens 8 is Vobj A×Va when Va≥2 (kV) and is Vobj>A×Va+10 (V) when Va=1 (kV). COPYRIGHT: (C)2010,JPO&INPIT
AbstractList PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus and a focused ion beam apparatus, capable of lowering a charged particle accelerating voltage, while suppressing a decrease in precision and efficiency of processing due to charged particle beams. SOLUTION: When a voltage applied between an LMIS 1 and an extraction electrode 13 is set to 5 to 8 (kV) and an applied voltage to a condenser lens 2 is set to 0 (kV), a distance between the upstream-side surface of the extraction electrode 13 and the beam limiting aperture 14 is determined so that a condition of an applied voltage Va to an acceleration electrode 15 and an applied voltage Vobj to an objective lens 8 in focusing charged particles on a sample 10 through an objective lens 8 is Vobj A×Va when Va≥2 (kV) and is Vobj>A×Va+10 (V) when Va=1 (kV). COPYRIGHT: (C)2010,JPO&INPIT
Author KAGA HIROYASU
AZUMA JUNZO
SASAKI MASAJI
Author_xml – fullname: SASAKI MASAJI
– fullname: KAGA HIROYASU
– fullname: AZUMA JUNZO
BookMark eNrjYmDJy89L5WSwc_ZwDHJ3dVEIcAwK8XT2cVVwcnX0VXAMAPIdQ0KDFRz9XBTc_J1Dg4FqPP390KR5GFjTEnOKU3mhNDeDkptriLOHbmpBfnxqcUFicmpeakm8V4CRgSEQGlkaWzgaE6UIAIm6K9s
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
ExternalDocumentID JP2010102938A
GroupedDBID EVB
ID FETCH-epo_espacenet_JP2010102938A3
IEDL.DBID EVB
IngestDate Fri Jul 19 14:47:17 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_JP2010102938A3
Notes Application Number: JP20080273127
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100506&DB=EPODOC&CC=JP&NR=2010102938A
ParticipantIDs epo_espacenet_JP2010102938A
PublicationCentury 2000
PublicationDate 20100506
PublicationDateYYYYMMDD 2010-05-06
PublicationDate_xml – month: 05
  year: 2010
  text: 20100506
  day: 06
PublicationDecade 2010
PublicationYear 2010
RelatedCompanies HITACHI HIGH-TECHNOLOGIES CORP
RelatedCompanies_xml – name: HITACHI HIGH-TECHNOLOGIES CORP
Score 2.769112
Snippet PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus and a focused ion beam apparatus, capable of lowering a charged particle accelerating...
SourceID epo
SourceType Open Access Repository
SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
Title CHARGED PARTICLE BEAM APPARATUS AND FOCUSED ION BEAM APPARATUS
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100506&DB=EPODOC&locale=&CC=JP&NR=2010102938A
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_mFPVNp6JOpYj0rdjvNg9V2rS1FruVfcjeRtNGEKEbruK_77WsOnzYW5ILxyXwu7vkcheAOwRBRqxMl2yWaZKuW6qUFbktyQZXZWIXKmd1RDcZmNFUj2fGrAMfbS5MUyf0uymOiIjKEe9Vo6-Xf5dYfvO2cnXP3nFo8RhOHF9cn46VupyJKfqeE6RDf0hFSp04FQejhoa2lGi2uwO76EdbNRyCV69OS1lu2pTwCPZSZFdWx9DhZQ8OaPv1Wg_2k3XEG5tr8K1O4IFG7ugp8IUUndBn-hIIXuAmgpti351Mx4I78IVwSKdjnIMq8h_5FG7DYEIjCQWZ_y57HqcbQmtn0C0XJT8HgZNCkblpZ1ZBdKKomcVyRgpT0438jSnFBfS3MLrcSu3DYRsel80r6FafX_warW7Fbprd-gH0HX9z
link.rule.ids 230,309,783,888,25576,76876
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT8IwEL8gGvFNUYPix2LM3hb3xbY-oBnd5kA2FhiGN7JuNTEmg8iM_763BZT4wFvbay7XJr-7a693BbhHECTETHTJYokm6bqpSkmWWpLc4apMrEzlrIzoBqHhT_XBrDOrwccmF6aqE_pdFUdERKWI96LS18u_Syynelu5emDvOLR48uKuI65Px0pZzsQQnV7XjUbOiIqUdgeRGI4rGtpSoln2Huyjj22WcHBfe2VaynLbpnjHcBAhu7w4gRrPm9Cgm6_XmnAYrCPe2FyDb3UKj9S3x8-uI0TohPbp0BV6rh0IdoR9O55OBDt0BG9EpxOcgyryH_kM7jw3pr6Egsx_lz0fRFtCa-dQzxc5b4HASabI3LASMyM6UdTEZCkjmaHpnfSNKdkFtHcwutxJvYWGHwfD-bAfvrThaBMql40rqBefX_waLXDBbqqd-wEaLoJm
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=CHARGED+PARTICLE+BEAM+APPARATUS+AND+FOCUSED+ION+BEAM+APPARATUS&rft.inventor=SASAKI+MASAJI&rft.inventor=KAGA+HIROYASU&rft.inventor=AZUMA+JUNZO&rft.date=2010-05-06&rft.externalDBID=A&rft.externalDocID=JP2010102938A