CHARGED PARTICLE BEAM APPARATUS AND FOCUSED ION BEAM APPARATUS

PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus and a focused ion beam apparatus, capable of lowering a charged particle accelerating voltage, while suppressing a decrease in precision and efficiency of processing due to charged particle beams. SOLUTION: When a voltage applied bet...

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Bibliographic Details
Main Authors SASAKI MASAJI, KAGA HIROYASU, AZUMA JUNZO
Format Patent
LanguageEnglish
Published 06.05.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus and a focused ion beam apparatus, capable of lowering a charged particle accelerating voltage, while suppressing a decrease in precision and efficiency of processing due to charged particle beams. SOLUTION: When a voltage applied between an LMIS 1 and an extraction electrode 13 is set to 5 to 8 (kV) and an applied voltage to a condenser lens 2 is set to 0 (kV), a distance between the upstream-side surface of the extraction electrode 13 and the beam limiting aperture 14 is determined so that a condition of an applied voltage Va to an acceleration electrode 15 and an applied voltage Vobj to an objective lens 8 in focusing charged particles on a sample 10 through an objective lens 8 is Vobj A×Va when Va≥2 (kV) and is Vobj>A×Va+10 (V) when Va=1 (kV). COPYRIGHT: (C)2010,JPO&INPIT
Bibliography:Application Number: JP20080273127