LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a lithographic apparatus that prevents the slip occurring on a substrate table. SOLUTION: The lithographic apparatus includes an illumination system IL configured to adjust a radiation beam B; a support MT constructed to support a patterning device MA, the patterning...

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Main Authors LOOPSTRA ERIK ROELOF, OTTENS JOOST JEROEN, VAN ABEELEN HENDRIKUS JOHANNES MARINUS, JEUNINK ANDRE BERNARDUS, SMITS PETER, VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS, LEENAARS RENE WILHELMUS ANTONIUS HUBERTUS, COMPEN RENE THEODORUS PETRUS, MEULENDIJKS ANTONIUS ARNOLDUS, HOUBEN MARTIJN
Format Patent
LanguageEnglish
Published 22.04.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a lithographic apparatus that prevents the slip occurring on a substrate table. SOLUTION: The lithographic apparatus includes an illumination system IL configured to adjust a radiation beam B; a support MT constructed to support a patterning device MA, the patterning device imparting the radiation beam B with a pattern in its cross-section to form a patterned radiation beam; a mirror block MB provided with the substrate table WT constructed to hold a substrate W; and a projection system PS configured to project the patterned radiation beam onto a target portion of the substrate W, wherein the mirror block MB is constructed and arranged to reduce slip between the mirror block MB and the substrate table WT. COPYRIGHT: (C)2010,JPO&INPIT
Bibliography:Application Number: JP20090225775