ANTISTATIC AGENT AND MOLDING RESIN MATERIAL USING THE SAME AND MASTER BATCH USING THE SAME, AND MOLDING USING THESE

• Main Authors: YONEHARA TAKASHI, ASAMI AKI
• Format: Patent
• Language: English
• Published: 15.04.2010
• Subjects: ADHESIVES; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMISTRY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; DYES; GENERAL PROCESSES OF COMPOUNDING; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS; WORKING-UP

PROBLEM TO BE SOLVED: To provide an antistatic agent which utilizes a charged layer being formed near a surface layer in molding to provide a layer in which the antistatic agent gathers there, and which can hold the layer as it is and a molding resin material using the same and a master batch using the same, and a molding using these. SOLUTION: Silicon dioxide 3 having hydrophilic groups 2 on a surface thereof, a surfactant 4 having antistatic function, and glycols 7 having hydrophilic groups (or polyhydric alcohols or higher alcohols excluding glycols, or ethers or glycidyl ethers) are mixed, whereby an even number of particles of the surfactant 4 are deposited to cover the silicon dioxide 3 and hydrophilic groups 5 are located on an outer surface to achieve nanoencapsulation. COPYRIGHT: (C)2010,JPO&INPIT