PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To establish a pattern forming technology using a reel-to-reel method and a liquid droplet discharge method, and to reduce cost of electronic equipment by mass production. SOLUTION: A system forms patterns on a belt-like substrate by the reel-to-reel method, including a liquid...

Full description

Saved in:
Bibliographic Details
Main Authors NIIDATE TAKESHI, SAKURADA KAZUAKI, UEHARA NOBORU
Format Patent
LanguageEnglish
Published 08.04.2010
Subjects
APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
PERFORMING OPERATIONS
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To establish a pattern forming technology using a reel-to-reel method and a liquid droplet discharge method, and to reduce cost of electronic equipment by mass production. SOLUTION: A system forms patterns on a belt-like substrate by the reel-to-reel method, including a liquid droplet discharge device 20 disposing a liquid material on the belt-like substrate 11 by the liquid droplet discharge method, and an atmospheric pressure control device 22 controlling the atmospheric pressure in a treatment space of the liquid droplet discharge device 20 higher than an adjacent space. The adjacent space may be constituted to include a space where heat treatment or optical treatment is performed to a membrane of the liquid material. COPYRIGHT: (C)2010,JPO&INPIT
Bibliography:Application Number: JP20090254772