MASK-CLEANING APPARATUS FOR ORGANIC EL, APPARATUS FOR MANUFACTURING ORGANIC EL DISPLAY, ORGANIC EL DISPLAY, AND MASK-CLEANING METHOD FOR ORGANIC EL

• Main Authors: KATAOKA FUMIO, NIRASAWA NOBUHIRO, KATAGIRI KENJI, IZAKI MAKOTO
• Format: Patent
• Language: English
• Published: 02.04.2010
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a cleaning apparatus for removing a vapor deposit which has deposited on a mask for an organic EL, in a completely noncontact state against a substrate. SOLUTION: The mask-cleaning apparatus 1 for removing a vapor deposition substance 20 that has deposited on the mask 2 that has a plurality of apertures formed therein for the organic EL scans a laser beam which has been oscillated in and emitted from a laser beam source 15 onto the surface of the mask 2 for the organic EL in a Y-direction while using a galvano-mirror 16, and scans the whole surface of the mask sheet by moving the mask in an X-direction with a moving section 14. The mask-cleaning apparatus 1 also has a blower portion 17 and a suction portion 18 which forms an air flow in the upper part of the mask 2 for the organic EL, and cleans the mask by crushing the vapor deposition substance 20 by laser scanning, makes the liberated product scatter toward the upper part, and makes the air flow transport the liberated product to remove the product. COPYRIGHT: (C)2010,JPO&INPIT