TREATMENT METHOD AND TREATMENT SYSTEM OF SAMPLE USING IONIC LIQUID

PROBLEM TO BE SOLVED: To provide a treatment method and a treatment system of a sample using ionic liquid preventing the exposure of a sample surface to an atmosphere even if conveyed in the atmosphere. SOLUTION: The sample 2 is subjected to processing in a vacuum in an ion beam processing device or...

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Bibliographic Details
Main Author KOZUKA MIHIRO
Format Patent
LanguageEnglish
Published 04.02.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:PROBLEM TO BE SOLVED: To provide a treatment method and a treatment system of a sample using ionic liquid preventing the exposure of a sample surface to an atmosphere even if conveyed in the atmosphere. SOLUTION: The sample 2 is subjected to processing in a vacuum in an ion beam processing device or the like, and the ionic liquid is applied to the sample 2 subjected to the processing. Then, the sample 2 to which the ionic liquid is applied is conveyed into a preparatory exhaust chamber 8 of an electronic microscope or the like, and the ionic liquid is removed in the preparatory exhaust chamber 8, and the sample 2 from which the ionic liquid is removed is observed by an electronic microscope body. COPYRIGHT: (C)2010,JPO&INPIT
Bibliography:Application Number: JP20080185608