PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE

• Main Authors: FUKAMI SEIJI, FUKUOKA RYOSUKE
• Format: Patent
• Language: English
• Published: 28.01.2010
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To perform a magnification correction individually in each of two orthogonal directions. SOLUTION: In a projection optical system PO, a first concave reflecting surface M1, a convex reflecting surface M2 and a second concave reflecting surface M3 are arranged in this order on an optical path from an object plane O to an image plane I, thereby projecting the image of an object placed at the object plane O onto the image plane I. The projection optical system PO includes a first refractive optical unit (A) and a second refractive optical unit (B) disposed on the optical path. Each of the first refractive optical unit (A) and the second refractive optical unit (B) has two or more cylindrical faces. The first refractive optical unit (A) is configured to be capable of adjusting the projection magnification of the projection optical system PO in a first direction, while the second refractive optical unit (B) is configured to be capable of adjusting the projection magnification of the projection optical system in a second direction orthogonal to the first direction. COPYRIGHT: (C)2010,JPO&INPIT