PARALLEL PROCESS FOCUS COMPENSATION

PROBLEM TO BE SOLVED: To provide systems, methods, and computer program for compensation for process errors of a lithography tool. SOLUTION: Such methods may include three steps. First, a first sensor senses a top surface of a wafer to provide first-sensor data which defines a first topographic map...

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Bibliographic Details
Main Author LYONS JOSEPH H
Format Patent
LanguageEnglish
Published 21.01.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide systems, methods, and computer program for compensation for process errors of a lithography tool. SOLUTION: Such methods may include three steps. First, a first sensor senses a top surface of a wafer to provide first-sensor data which defines a first topographic map of the first surface of the wafer. The first sensor is, for example, an air gauge. Second, a second sensor senses the top surface of the wafer in parallel with the first sensor to provide second-sensor data which defines a second topographic map of the first surface of the wafer. The second sensor is, for example, an optical sensor or a capacitance sensor. Third, a calibration module calibrates focus-positioning parameters of an exposure system on the basis of the first- and the second-sensor data. The calibration module may be embodied in hardware, software, firmware, or a combination thereof. COPYRIGHT: (C)2010,JPO&INPIT
Bibliography:Application Number: JP20090148145