COATING APPARATUS AND COATING METHOD

PROBLEM TO BE SOLVED: To provide a coating apparatus and a coating method, wherein defective application is prevented and the upper part of a substrate conveying part is kept clean, and to provide the coating apparatus for avoiding deficiencies such as damage and breakdowns of constituent members of...

Full description

Saved in:
Bibliographic Details
Main Authors TAKASE SHINJI, TATEMA NAONOBU, SHO YOSHIAKI, TANIMOTO TSUNEO, SHIMIZU AKIHIRO
Format Patent
LanguageEnglish
Published 14.01.2010
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:PROBLEM TO BE SOLVED: To provide a coating apparatus and a coating method, wherein defective application is prevented and the upper part of a substrate conveying part is kept clean, and to provide the coating apparatus for avoiding deficiencies such as damage and breakdowns of constituent members of the apparatus. SOLUTION: Since the coating apparatus is constituted so that the substrate conveying part is provided with: a conveying mechanism 23 which has a holding part 23b for holding the substrate S and is used for conveying the substrate of a held state; and an auxiliary mechanism 24 for pressing the substrate to the holding part, the substrate can be held not only by the holding part of the conveying mechanism but also by the auxiliary mechanism. Therefore, the substrate is held more strongly and the displacement of the substrate is restrained much more. Thereby, the defective application due to the displacement of the substrate can be prevented and the upper part of the substrate conveying part can be kept clean. COPYRIGHT: (C)2010,JPO&INPIT
Bibliography:Application Number: JP20080167362