MIRROR FOR EXTREME ULTRA VIOLET, MANUFACTURING METHOD FOR MIRROR FOR EXTREME ULTRA VIOLET, AND EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE

• Main Authors: WAKABAYASHI OSAMU, GEORGE SOUMAGNE, MORIYA MASATO
• Format: Patent
• Language: English
• Published: 07.01.2010
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide an EUV light source device capable of eliminating lights other than EUV light, and supplying only the EUV light to an exposure machine. SOLUTION: A multilayer film of Mo/Si is formed on the front surface 131 of an EUV collector mirror 130, and blazed grooves 133 are...