LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a system capable of rapidly detecting detailed information related to the performance of a substrate and a lithographic apparatus. SOLUTION: A property of an extended pattern formed by at least one line generally extending in a first direction is detected. The extend...

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Bibliographic Details
Main Authors SEGERS BART PETER BERT, SLOTBOOM DAAN MAURTIS, HOFMANS GERARDUS CAROLUS JOHANNUS
Format Patent
LanguageEnglish
Published 24.12.2009
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a system capable of rapidly detecting detailed information related to the performance of a substrate and a lithographic apparatus. SOLUTION: A property of an extended pattern formed by at least one line generally extending in a first direction is detected. The extended pattern is formed on a substrate or on a substrate table and, preferably, extends over the length of at least 50 times of the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring a property of the extended pattern along the first direction. COPYRIGHT: (C)2010,JPO&INPIT
Bibliography:Application Number: JP20090132702