ANTIMONY OXIDE SPUTTERING TARGET HAVING EXCELLENT CRACKING RESISTANCE

• Main Authors: MISEKI KENICHIRO, CHO SHUHIN
• Format: Patent
• Language: English
• Published: 10.12.2009
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide an antimony oxide sputtering target having excellent crack resistance. SOLUTION: The antimony oxide sputtering target having excellent crack resistance has the component composition consisting of Sb2Oy(where, y denotes the atom ratio of 1.7 to 2.85), and the structure with Sb2O3particle phase being dispersed in Sb base. In the Sb2O3particle phase, the maximum particle size is ≤250 μm. COPYRIGHT: (C)2010,JPO&INPIT