METHOD FOR FORMING PLASMA-PHOTO COMBINED CVD FILM

• Main Authors: INAGAKI HAJIME, IEGI TOSHIHIDE
• Format: Patent
• Language: English
• Published: 03.12.2009
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a method for forming a plasma-photo combined CVD film, in which heat damage by an ion is effectively improved while using a plasma CVD method, and the film can be effectively formed even on a substrate which is poor in heat resistance and needs to be positively prevented from heat deformation. SOLUTION: The method comprises feeding a reactive gas into a plasma generating region 3, introducing the plasma generated in the region into a deposition chamber 5 containing a substrate 19 through a bypass formed by a plasma shield 7, and forming a film on the substrate 19 while promoting a CVD reaction by photoirradiation in the deposition chamber 5. COPYRIGHT: (C)2010,JPO&INPIT