ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH

• Main Authors: FUJII KANA, YOKOYAMA SHIGEO, SUGIYAMA SHINICHI, DOBASHI TORU, FUJIMORI TORU, MIZUTANI KAZUYOSHI, TOMIGA TAKAMITSU, HIRANO SHUJI
• Format: Patent
• Language: English
• Published: 12.11.2009
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a positive resist composition satisfying the requirements of wide exposure latitude, reduction in line edge roughness, a desirable pattern configuration and dry etching resistance and giving a pattern with few defects after development, and to provide a method for forming a pattern by use of the above composition. SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition is disclosed, comprising: (A) a resin containing repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid. In the formulae, each of R1independently represents a hydrogen atom or an optionally substituted methyl group; R2represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group; and n is an integer of 0 to 5; provided that when n is ≥2, multiple R2s may be identical to or different from each other. COPYRIGHT: (C)2010,JPO&INPIT