FLUX FORMING DEVICE
PROBLEM TO BE SOLVED: To cope with a problem that it is necessary to apply flux with high viscosity by lowering the viscosity when the flux is applied on an electrode formed on a substrate. SOLUTION: This flux forming device is provided with a reservoir tank which accumulates the flux to be supplied...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
29.10.2009
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To cope with a problem that it is necessary to apply flux with high viscosity by lowering the viscosity when the flux is applied on an electrode formed on a substrate. SOLUTION: This flux forming device is provided with a reservoir tank which accumulates the flux to be supplied to an ink jet head, the ink jet head and a piping part which connects both are provided with heating mechanisms, the flux is discharged on the substrate by lowering the viscosity of the flux by raising temperature, and a table is provided with a cooling mechanism which rapidly cools the substrate so that the flux discharged on the substrate does not flow out. COPYRIGHT: (C)2010,JPO&INPIT |
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Bibliography: | Application Number: JP20080100400 |