FLUX FORMING DEVICE

PROBLEM TO BE SOLVED: To cope with a problem that it is necessary to apply flux with high viscosity by lowering the viscosity when the flux is applied on an electrode formed on a substrate. SOLUTION: This flux forming device is provided with a reservoir tank which accumulates the flux to be supplied...

Full description

Saved in:
Bibliographic Details
Main Authors TOKUYASU YOSHIAKI, NAKAMURA HIDEO, WATASE NAOKI, ABE ISAO, MUKAI NORIAKI
Format Patent
LanguageEnglish
Published 29.10.2009
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:PROBLEM TO BE SOLVED: To cope with a problem that it is necessary to apply flux with high viscosity by lowering the viscosity when the flux is applied on an electrode formed on a substrate. SOLUTION: This flux forming device is provided with a reservoir tank which accumulates the flux to be supplied to an ink jet head, the ink jet head and a piping part which connects both are provided with heating mechanisms, the flux is discharged on the substrate by lowering the viscosity of the flux by raising temperature, and a table is provided with a cooling mechanism which rapidly cools the substrate so that the flux discharged on the substrate does not flow out. COPYRIGHT: (C)2010,JPO&INPIT
Bibliography:Application Number: JP20080100400