HIGH-FREQUENCY POWER SUPPLY DEVICE

• Main Author: FUKUMOTO YOSHIKI
• Format: Patent
• Language: English
• Published: 15.10.2009
• Subjects: AMPLIFIERS; BASIC ELECTRIC ELEMENTS; BASIC ELECTRONIC CIRCUITRY; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To solve a problem that when an output control, a reflection protection control, and a loss reduction control of a high-frequency power supply device 1 are carried out, one high-frequency power supply device 6 gives an adverse effect to the output control in a plasma treatment system using a high-frequency power of different frequencies. SOLUTION: The high-frequency power supply device can define existence of a filter and characteristics of the filter so that the frequency component of a signal outputted from a directional coupler 18 may be selected appropriately by control types, and three of the output control, reflection protection control, and loss reduction control are made appropriately. For example, as shown in Fig.1, the output of the directional coupler 18 through an advance wave-side band pass filter 32 which passes the basic frequency component is used for output control. For the other control, the band pass filter is not used. The same is true in the reflection wave side. COPYRIGHT: (C)2010,JPO&INPIT