METHOD FOR MANUFACTURING PHOTOMASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
PROBLEM TO BE SOLVED: To provide a method for manufacturing a photomask, by which dimensional accuracy on a final pattern after multiple exposure processes can be improved, and to provide a method for manufacturing a semiconductor device. SOLUTION: The method for manufacturing the photomask comprise...
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Main Author | |
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Format | Patent |
Language | English |
Published |
24.09.2009
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a method for manufacturing a photomask, by which dimensional accuracy on a final pattern after multiple exposure processes can be improved, and to provide a method for manufacturing a semiconductor device. SOLUTION: The method for manufacturing the photomask comprises: producing a first photomask of first and second photomasks used for forming a pattern, by drawing a first mask pattern based on the design data corresponding the photomask; measuring a positional error of the first mask pattern in the first photomask; calculating a systematic positional error from the positional error of the first mask pattern; and producing the second photomask by drawing a second mask pattern based on a coordinate system that reflects the systematic positional error, based on the design data corresponding to the second photomask. COPYRIGHT: (C)2009,JPO&INPIT |
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Bibliography: | Application Number: JP20080061063 |